Abstract

A probe station which comprises a base machine, a chuck mounted on the base machine to hold a device under test (DUT), a probe platen mounted on the base machine on which to mount probes for the device, a microscope mounted on the base machine having a field of view on the DUT on the chuck, and a single laser, mounted with the microscope. The single laser supplies an output beam in a plurality of wavelengths through the microscope optics on a beam line to the field of view of the microscope. The laser system includes a solid state laser, a harmonic generator coupled with the solid state laser, and switchable optics for selecting the wavelength of the output beam from among two or more selectable wavelengths. In addition, the laser system includes a variable attenuator, based on a unique half-wave plate, which operates for the plurality of wavelengths which are selectable as outputs in the infrared (1064 nanometers), in the green (532 nanometers), and in the ultraviolet (355 nanometers, or 266 nanometers). These wavelengths correspond to the fundamental output wavelength of the Nd:YAG laser, the second harmonic, and either the third or fourth harmonic of the laser.

Other References

Product Literature, "for Profile Analysis Sample Preparation Suss Manual Scribers", Karl Suss America, Inc., Waterbury Center, Vermont.

Product Literature, "Excimer Laser Cutter Attachment", Model LCM-308, by Florod Corporation, Gardena, California.

Mielenz, et al., "Accuracy of Polarization Attenuators"; Applied Optics; vol. 11, No. 3, Mar. 1972, pp. 594-602.