Abstract

The apparatus for depositing thin films on both a first surface and a second surface of the substrate via off-axis laser ablation according to present invention comprises (1) a vacuum chamber, the vacuum chamber having (a) a first target of a first deposition material supported by a first target holder, (b) a second target of a second deposition material supported by a second target holder so as to positioned to be substantially coplanar with the first target, (c) a substrate holder for holding a substrate above a space between the first and second targets, the substrate being oriented to be substantially perpendicular to the targets, (d) a heating means for heating the first and second surfaces of the substrate, (e) a first entrance window through which a first laser beam passes to impinge onto the first target with a predetermined angle, and (f) a second entrance window through which a second laser beam passes to impinge onto the second target with a predetermined angle and (2) a laser optical system comprising at least one laser beam source and an optical path system from said laser beam source to said targets, the optical path system including mirrors for reflecting the laser beams toward the targets through the first and second entrance windows of the chamber.

Other References

Chrisey et al, ed. Pulsed Laser Deposition of Thin Films, John Wiley & Sons, Inc., New York, 1994 (no month), excerpts p. 18, 167-168, 192-193, 294-296 and 1318.

Holzapfel et al, Off-axis laser deposition of YBa(2) Cu(3) O(7-).delta. thin films, Applied Physics Letters, vol. 61, no. 26, Dec. 28, 1992 pp. 3178-3180. Dec.