Abstract

A color filter is manufactured in the steps described below. 1 A plurality of transparent electrodes which extend in a straight line at fixed pitch intervals are formed on one surface of a transparent board: 2 color filters of a plurality of colors are stacked on transparent electrodes in a predetermined sequence: 3 a high energy beam is scanned at fixed pitch intervals in a direction intersecting at right angles to the extension direction of the transparent electrodes in order to selectively remove the transparent electrodes and the color filters, or only the color filters: 4 a black resist is coated onto that surface of the transparent board where the transparent electrodes are formed, light for exposing the black resist is irradiated from the back of the transparent board, and the black resist layer coated onto an area other than the color filter formation portion is exposed: 5 the exposed transparent board is developed to selectively remove the unexposed black resist coated on the color filters, and thus a light-shielding film is formed around the color filter. In this case, when the unexposed black resist is removed by using laser light with a short wavelength of 380 nm or less as the high energy beam, removal at the same width is made possible regardless of the color of the color filters, and processing quality is improved.

Other References

Grum et al., "Optical Radiation Measurements" vol. 1, pp. 145-149 (1979).

Translation of JP 5-203807, "Color Filter Manufacturing Method", Fukuchi et al. (Aug. 1993).