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United States Patent 6,419,148
Waxler ,   et al. July 16, 2002

System for forming bumps on wafers

Abstract

A system and method for forming bumps on an integrated circuit including a scanning direct laser imager employed to selectably expose a photosensitive layer deposited on an integrated circuit substrate, thereby to define regions overlying selected portions of the substrate, a developer developing said photosensitive layer to form apertures in the photosensitive layer at the defined regions, and a solder applicator applying a solder composition to the apertures to define solder bumps on the integrated circuit at selected portions thereof.


Inventors: Waxler; Scott Steven (North Reading, MA); Zemer; Dan (Rehovot, IL)
Assignee: Orbotech Ltd. (Yavne, IL)
Appl. No.: 767645
Filed: January 23, 2001

Current U.S. Class: 228/214; 228/14; 219/121.7
Intern'l Class: B23K 026/00
Field of Search: 228/259,6.1,6.2,118,179.1,180.1,180.21,180.22,188,189,214,14,13 219/121.68,121.69,121.75,121.79,121.7


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Foreign Patent Documents
WO 00/02424Jan., 2000WO.


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Primary Examiner: Elve; M. Alexander
Assistant Examiner: Johnson; Jonathan
Attorney, Agent or Firm: Ladas & Parry

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